In this paper, nanoscale resolution scanning
capacitance microscopy (SCM) and local capacitance–voltage measurements were
used to probe the interfacial donor concentration in SiO2/4H–SiC systems
annealed in N2O. Such nitrogen-based annealings are commonly employed to
passivate SiO2/SiC interface traps, and result both in the incorporation of
N-related donors in SiC and in the increase of the mobility in the inversion
layer in 4H–SiC MOS-devices. From our SCM measurements, a spatially
inhomogeneous donor distribution was observed in the SiO2/4H–SiC system
subjected to N2O annealing. Hence, the effect of a phosphorus implantation
before the oxide deposition and N2O annealing was also evaluated. In this case,
besides an increased average donor concentration, an improvement of the lateral
homogeneity of the active doping was also detected. The possible implications
of such a pre-implantation doping of the near-interface region on 4H–SiC
MOS-devices are discussed.
Source:IOPscience
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